The self-assembly of block copolymer thin films can generate dense nanoscale patterns over large areas 1,2,3,4,5,6,7,8. When directed by a sparse topographic or chemical template, the block copolymers ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Get an overview of design patterns, then use what you've learned to evaluate whether the Composite pattern is a good choice for a particular Java use case Numerous strategies have been devised to ...