Nanoscale lithographic technologies have been intensively studied for the development of the next generation of semiconductor manufacturing practices. While mask-less/direct-write electron beam (EB) ...
Inverse problems in Euler–Bernoulli beam dynamics focus on determining unknown parameters or source distributions within the governing beam equation from external observations. This area spans the ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback